Thermal & Implant
Rapid Thermal Anneal
- Annealing of clean MOS grade silicon wafers
Furnaces
- Used for wet oxidation of silicon substrates
- Used for diffusion of p-type dopants
- Used for diffusion of n-type dopants
- Used for dry oxidation of silicon substrates
- Fitted with external torch for low temp wet oxide growth
- Used for wet oxidation of silicon substrates
- Used for anneals & wet oxide growth
- Used for high temperature anneals
Implant
- Used for implantation of boron and phosphorous