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Thermal & Implant
Rapid Thermal Anneal
Annealing of clean MOS grade silicon wafers
Furnaces
Used for wet oxidation of silicon substrates
Used for diffusion of p-type dopants
Used for diffusion of n-type dopants
Used for dry oxidation of silicon substrates
Fitted with external torch for low temp wet oxide growth
Used for wet oxidation of silicon substrates
Used for anneals & wet oxide growth
Used for high temperature anneals
Implant
Used for implantation of boron and phosphorous