This Confluence space has been migrated and is no longer current. The content on this space has been set to read only.
ASML Stepper
Facts
The ASML stepper is a 5x stepper with environmental control.
Uses 6" x 6" Quartz masks
Features on the photomask are reduced 5x down to the printed feature size.
Capable of features down to 0.35um in size
Field size is 22x22mm
Variable Numerical aperture 0.48-0.60
Conventional or annular illumination
Overlay from layer to layer is better than 50nm
It is configured for 150mm wafers and uses the mercury i-line 365nm for exposure.
Personnel
Tool Engineer - John Nash
Process Engineer - Sean O'Brien
Super User - Patricia Meller
Super User - Eli Powell
Super User - William Huang
Any of these personnel can certify new users
Tool & Process Information
Tutorial on the ASML Stepper and how it works
Compliments of Dr. Fuller & Stephanie Bolster