GCA Stepper

Facts

• The GCA stepper is a 5x stepper with environmental control.
  • Uses 5" x 5" x 0.09" soda lime photomasks.
  • Features on the photomask are reduced 5x down to the printed feature size.
  • Excellent tool for larger feature sizes.
  • Capable of features down to 1um in size
  • Capable of 0.35um pattern overlay
  • Field size of 20x20mm
  • Numerical aperture of 0.28

• It is configured for 100mm and 150mm wafers and uses the mercury g-line 436nm for exposure.
  • This system uses "pucks" to hold the wafers. Different pucks could be made for other substrate sizes.

• It has a larger depth of field and is useful for exposures over higher substrate topography - as can be found in MEMs devices

Personnel

• Tool Engineer 
• Process Engineer - Sean O'Brien
• Super User - Patricia Meller
• Super User - Karl Hirschman
• Superuser - Eli Powell
• Any of these personnel can certify new users

Manuals & Users

• GCA Stepper Manual - Rev J - 4/4/20
• GCA Job Creation Manual - Rev C - 4/29/20
• GCA Certification Checklist - 2/2/21